Regulatory Relief for Certain Stationary Sources To Promote American Chemical Manufacturing Security

This proclamation exempts certain stationary sources subject to EPA's HON Rule (New Source Performance Standards and National Emission Standards for Hazardous Air Pollutants for the Synthetic Organic Chemical Manufacturing Industry and Group I & II Polymers and Resins Industry, 89 FR 42932), as identified in Annex I, from those aspects of the rule promulgated under section 112 of the Clean Air Act. Each compliance deadline is extended by 2 years, during which the listed sources remain subject to the standards in effect prior to the HON Rule. The President determines that the technology to implement the HON Rule is not commercially available and that the exemption is in the national security interests of the United States.

None.

No known legal challenges.